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Group III MO Chemicals

 

The DEOX™ process eliminates oxygen associated impurities leading to improved device results.
Advantages include:-
  • Lower growth temperature for Al structures (typically 650C )
  • Consistent batch to batch performance reduces qualification times
  • Reproducible background doping levels
  • Improved minority carrier lifetimes
  • Reduced recombination centres resulting in higher efficiency devices
  • DEOXtm TMAl
    DEOXtm TMI
    DEOXtm TMG
    DEOXtm TEGa

     
    Group V MO Chemicals  
      Advantages over gaseous hydrides include:-
  • Enhanced and more consistent quality
  • Lower growth temperatures
  • Reduced exhaust deposits
  • Improved safety

  • VR Grade TBP
    VR Grade TBA
    DEOXtm TMSb

     
    Dopants  
     

    Bubbler sizes available from Cambridge Chemicals.

    Click here to request MSDS information.


    DEZn
    DMZn
    Cp2Mg
    DTBSi

    Also Available form Cambridge Chemicals:

    MBE source materials: Ultra pure Ga, In and Al

    New products currently under development.

    Carbon nano tubes, Graphene

    OLED reagents

    Novel TCO replacements for ITO

    Small evaluation samples can be supplied upon request.

    Other reagents available on request.

    We at Cambridge Chemicals are always ready to help you.
    If you have any sales or technical questions you can fill in the form and E-mail us or contact us at the address below.
    Directions to Cambridge Chemicals.

    Cambridge Chemical Company Ltd.
    Unit 5 Chesterton Mill
    French's Road
    Cambridge CB4 3NP
    Tel: 00 44 1223 352244
    Fax: 00 44 1223 352444
    Email: Sales@camchem.co.uk

     

     
    Cambridge Chemical Company Ltd Unit 5 Chesterton Mills French's Road Cambridge UK CB4 3NP
     
    Tel: +44 (0)1223 319415 Fax: +44 (0)1223 352444