Group III MO Chemicals |
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The DEOX™ process eliminates oxygen associated impurities leading to improved device results.
Advantages include:-
Lower growth temperature for Al structures (typically 650C )
Consistent batch to batch performance reduces qualification times
Reproducible background doping levels
Improved minority carrier lifetimes
Reduced recombination centres resulting in higher efficiency devices |
| DEOXtm TMAl |
| DEOXtm TMI |
| DEOXtm TMG |
| DEOXtm TEGa |
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| Group V MO Chemicals |
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Advantages over gaseous hydrides include:-
Enhanced and more consistent quality
Lower growth temperatures
Reduced exhaust deposits
Improved safety |
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| VR Grade TBP |
| VR Grade TBA |
| DEOXtm TMSb |
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| Dopants |
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Bubbler sizes available from Cambridge Chemicals.
Click here to request MSDS information. |
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| DEZn |
| DMZn |
| Cp2Mg |
| DTBSi |
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Also Available form Cambridge Chemicals:
MBE source materials: Ultra pure Ga, In and Al
New products currently under development.
Carbon nano tubes, Graphene
OLED reagents
Novel TCO replacements for ITO
Small evaluation samples can be supplied upon request.
Other reagents available on request.
We at Cambridge Chemicals
are always ready to help you.
If you have any sales or technical questions you
can fill in the form and E-mail us or contact us at the
address below.
Directions to Cambridge Chemicals.
Cambridge Chemical Company Ltd.
Unit 5 Chesterton Mill
French's Road
Cambridge CB4 3NP
Tel: 00 44 1223 352244
Fax: 00 44 1223 352444
Email: Sales@camchem.co.uk
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